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Rotary vane vacuum pump used in plasma cleaning _

by:J&T     2020-07-10

plasma cleaning is a cleaning method, its depends on the 'plasma state' material 'activation' to remove surface stains. It belongs to the electronics industry, clean the dry cleaning. Vacuum pump needs to make certain to meet the requirements of clean vacuum conditions. Let's talk about rotary vane vacuum water pump in the application of plasma cleaning technology process, indicating the rotation. What is the distinguishing feature of thin-film vacuum pump.

plasma cleaning the plasma is mainly composed of special gas molecules in a vacuum and discharge and other special occasions, such as low pressure gas glow plasma. In simple terms, mentioned in the beginning, plasma cleaning needs (under the vacuum Usually about 100 pa) And therefore need a vacuum rotary vane vacuum water pump.

rotary vane vacuum pumps for plasma cleaning process is what?

main process includes: first of all, will be cleaning the workpiece fixed into the vacuum chamber, start the rotary vane vacuum pump, etc. , and began pumping air into vacuum state, vacuum exhaust to about 10 pa; And then will be used in plasma cleaning gas into the vacuum chamber, According to the cleaning materials) Is different, the choice of gas is different, such as oxygen, hydrogen and argon, nitrogen, etc. , and pressure maintain at about 100 pa; In the vacuum chamber high-frequency voltage applied between the electrode and the grounding device to make the gas be destroyed, and by glow discharge plasma to produce plasma; Plasma generated in a vacuum chamber after clean surface completely covered, began to clean operation, and the cleaning process for several seconds to several minutes. The whole process relies on the plasma in the electromagnetic field space mobile and bombard the surface of the object to be processed, so as to realize surface treatment, the effect of cleaning and etching ( The cleaning process to a certain extent, is a slight etching process) ) ; Upon the completion of the cleaning, evaporation is expelled. Dirt and clean gas, at the same time, the air into the vacuum chamber to return to normal atmospheric pressure.

in the cleaning process, when the rotary vane vacuum pump control the vacuum of the vacuum chamber, the velocity of the gas determines the luminous color: if the color heavier, low vacuum, gas flow is great; When it is white, high vacuum degree, air flow is very small; Need according to the required to determine the specific vacuum treatment effect.

the base board of plasma cleaning technology does not distinguish between object types, metal, semiconductor and oxides and most polymer materials ( Such as polypropylene, polyester, polyimide, polyvinyl chloride (PVC), epoxy resin, even PTFE) 。 Raw materials such as ethylene is a good way to deal with, and can be used as a local and overall clean and complex structures. It also has the environmental protection, safety, easy to control. So, in many aspects, especially the precision parts cleaning and new semiconductor materials research and the integrated circuit device manufacturing has gradually replace the wet cleaning process.

compared with other domestic similar products, the advantages of rotary vane vacuum pumps in plasma cleaning technology:

1. Easy to use, easy to install and maintain;

2。 Rotary vane vacuum water pump with angry town valve, can remove a small amount of water vapor;

3。 Rotary blade limiting vacuum of vacuum pump is high;

4。 The built-in forced oil, sufficient lubrication, reliable performance;

5。 With automatic oil return double safety device;

6。 Even if the inlet pressure of 1. 33 x 10 pa, can continuous operation;

7。 No oil, no oil, no pollution to the work environment.


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